منابع مشابه
Multicusp Ion Source for Induction Linac Applications
At LBNL we are investigating the use of gaseous ion sources for induction linac applications such as heavy ion inertial fusion. Typical requirements for the ion source is to produce 20 μs pulses with a rise-time of 2 μs. The current density should be greater than 100 mA/cm2 at a duty cycle of 10 Hz [1]. Noble gases such as krypton, neon and xenon will be used. The source used for the measuremen...
متن کاملGas Flow Influence on Negative Hydrogen Ion Generation within the Microwave-driven Negative Ion Source*
H ion was generated through two processes within a volume Csfree source. The density of molecule hydrogen gas will impact on the electron temperature within the primary discharge chamber that will influence the population of vibrational excited H2. Within the extraction region, the interaction between molecule hydrogen and H ion will is cause the dissociation of negative ion. To better understa...
متن کاملStatus of the J-parc Negative Hydrogen Ion Source
A cesium-free negative hydrogen ion source driven with a LaB6 filament is being operated for J-PARC. The beam commissioning of J-PARC accelerators started in November 2006. As of June 2010, there have been 34 beam commissioning or supply runs. In these runs, the ion source has been successfully operated in two different modes such as low current mode of 5 mA and high current mode of 30 mA. Acco...
متن کاملNumerical simulation for optimization of multipole permanent magnets of multicusp ion source
A new ion source will be designed and manufactured for the CYCLONE30 commercial cyclotron with a much advanced performance compared with the previous one. The newly designed ion source has more plasma density, which is designed to deliver an H beam at 30 keV. In this paper numerical simulation of the magnetic flux density from permanent magnet used for a multicusp ion source, plasma confinement...
متن کاملApplication of a Pulsed , RF - driven ) Multicusp Source for Low Energy Plasma Immersion Ion Implantation
The multicusp ion source has the capability of producing large volumes of uniform, quiescent, high density plasmas. Due to the versatility of the multicusp source, a plasma chamber suited for plasma immersion ion implantation (PIII) was readily constructed. Conventional PIII pulses the bias voltage applied to the substrate which is immersed in a CW mode plasma. However, in the interest of findi...
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ژورنال
عنوان ژورنال: IEEE Transactions on Nuclear Science
سال: 1985
ISSN: 0018-9499
DOI: 10.1109/tns.1985.4333722